The
LEO 1550 field emission scanning electron microscope acquired in 2001, will provide the best capability of high resolution of paragenesis and fracturing history. The SEM will be used to screen apatite crystals for U- and Th-bearing mineral inclusions, such as monazite and zircon that can easily detected using back-scattered electron (BSE) imaging due to their high atomic number and resulting bright appearance.
The LEO 1550 has a large specimen chamber and a 5 axis motorized stage. It is particularly useful for handling large samples and for multiple smaller specimens.
This instrument is capable of resolving 2.1 nm at operating voltages as low as 1kV and has a wide range of operating voltages, from 100 - 30,000 V. Its high probe current and stability make it ideal for fast X-ray analysis and EBSP pattern acquisition. Simultaneous high resolution secondary electron detection and BSD imaging is facilitated by an 8.5 mm working distance.
All images are digitally captured at 3072 pixels x 2304 lines in a conventional format that can be opened by any standard image program. We have drives for floppy, 100 mB Zip disks, and a CD-burner for the storage and transport of images and analytical information.
We possess the following detectors and services:
- Secondary electron detector The standard detector for scanning electron microscope imaging.
- X-Ray analysis EDAX Phoenix detector with Genesis software is used for spectrum analysis and high resolution mapping of elements with high and low Z numbers, from boron and higher.
- Backscatter Four quadrant detector for topographic and compositional analysis.
- EPSP detector TSK-OIM electron diffraction system for crystallographic texture analysis. Users can examine micro structure of materials, including phase identification, deformations, and boundary characteristics.
- Cathodoluminescence A PanaCL detector provides the user with the ability to record images of trace and minor element variation in materials, including variations in chemical composition, textures, and growth zones.
- Beamwriting A computer controlled electron beam lithography system is installed for the fabrication of nanodevices.
- Equipment, supplies, and instructions for the preparation of many samples for scanning electron microscopy are provided. Our preparation equipment includes
- Critical point dryer to dry delicate specimens
- Sputter coater for noble metal coating of non-conductive specimens
- Denton vacuum evaporator for refractory metal coating
- Printers, scanners, and computers for image analysis, presentation, and publication.
For more information, go to the
Microscopy and Electronic Imaging Laboratory home page.
